성능
- Plasma source type : Parallel plate plasma (CCP)
- RF power supply : 13.56 MHz, 600W, Automatic matching
- Vac. Chamber : aluminum chamber, anti-corrosion treated surface
- RIE platen : water cooled, for Φ6“
- aluminum chamber with view port
- direct sample transfer under vacuum
- Main chamber : low vacuum gauge and wide range gauge
- Loadlock chamber : low vacuum gauge
- Turbo molecular pump (300L/sec) backed up with mechanical pump (1000L/sec)
- Base pressure : 1.0E-7TorrMass Flow controller (MFC) : BCl3, CF4, Ar, O2
- Safety interlocked
- pressure, self bias, RF power, Turbo speed and valve, and MFC status displays
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