Clean room Deposition machine
ALD(Atomic Layer Deposition)
| Model | Lucida D100 |
|---|---|
| Manufacturer (Country) | NCD(Kor) |
| Purchase Date | 2014-02-18 |
| Purpose of Use | Ultra-thin film deposition with good thickness uniformity and conformal step coverage |
Product Description and Specifications● Deposition materials: Al2O3, HfO2
● Wafer size: ≤4“ (allowing the use of fragmentary samples) ● Substrate temperature: 25C°–350C° ● Substrate size: 100-200 mm ● Substrate Temperature: 25℃-J16 350 ℃ (± 0.2 ℃) @ 1Torr, in wafer ● Precursor sources: 3 (heated 2 sources and H2O source) ● Deposition uniformity: <±2% ● Footprint: 950 x 700 mm ● Compatibility:Clean room class 100 ● Control System: PC control base (full auto) ● Optional: Up to 4 heated sources ● Optional: Lucida cooler (2ch) |
|
