Clean room Deposition machine
E-beam Evaporator
| Model | GLAD E-BEAM EVAPORATOR SYSTEM, KVE-E4006L |
|---|---|
| Manufacturer (Country) | Korea vacuum tech (Kor) |
| Purchase Date | 2014-04-15 |
| Purpose of Use | Metal and oxide deposition |
Product Description and Specifications● Deposition source (metal): Au, Ti, Ni, Pt, Cr, Al, etc.
● Deposition source (oxide): SiO2 etc. ● Wafer size: ≤4“ ● Substrate rotation and tilt enabled ● Process chamber: stainless steel ● Vacuum pumping station: TMP ● Loadlock chamber: top door, stainless steel ● Substrate unit: rotation / heating / cooling ● Sample size: ≤4“ ● Vacuum gaugecontroller: ATM - 1.0E-10Torr ● Power supply unit: 6kW, 8kW, 10kW ● Crucible size: 4cc, 7cc, 15cc, 25cc ● Pocket number: 6 ● Film thickness uniformity: < ±5% ● Ultimate pressure: < 5.0E - 7Torr ● System control: PLC based PC auto |
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