INSTITUTE OF APPLIED PHYSICS

List

Material Analysis Laboratory 1. Device Fabrication

RF & DC Magnetron Sputter

Model KVS-5000L
Manufacturer (Country) 코리아바큠테크(주)
Purchase Date 2013-05-03
Purpose of Use Metal and Oxide Deposition

Product Description and Specifications

  • 금속 및 산화물 진공 증착용 장비
  • Deposition sample size : 조각 시편 ~ 2 inch
  • System control : PLC based PC auto
  • System Safety : 진공냉각수압축공기와 시스템 간 안전 연동 방식
  • Main Chamber + Loadlock Chamber
  • Sputtering source : 6 set (SiO2, BTO, Nb, TiN, Nb, Au)
  • Heating temperature and uniformity : ±5, ~1000
  • Deposition uniformity : <±3%
  • Ultimate Pressure : 5.0E-9Torr
RF & DC Magnetron Sputter