Material Analysis Laboratory 1. Device Fabrication
UV Patterning System
| Model |
MJB4 |
| Manufacturer (Country) |
Suss Microtec |
| Purchase Date |
2014-06-02 |
| Purpose of Use |
Photo Lithography (with photo-mask) |
Product Description and Specifications
- Machine base with alignment stage and exposure unit
- Split field microscope with eyepieces and turret
- Video image system for microscope
- Objective 5X (2EA) Objective 10X (2EA)
- Lamp adapter
- Lamp power supply unit CIC1200
- High resolution UV optics for 350 ~ 450 nm
- Internal light sensor 365/405NM for CIC1200
- Teflon coated chuck for 5×5 mm and 20×20 mm piece substrate with vacuum Mode
- Mask holder for 5“×5“mask with opening of 2“×2“ substrate
- UV optometer
- UV light measurement probe 365/405NM for optometer
- Lamp 350W/S (2EA)
- Vacuum pump for facility
- Vibration isolation damping system
- Substrate Size : For 5×5 mm and 20×20 mm piece substrate
- Mask Size : For 5“×5“mask
- Exposure Optics : Hg-Lamp 350W
- UV400 : 350 ~ 450 nm (I-H-G-line)
- Intensity Uniformity: <±3%
- Printing Resolution : down to 0.7~0.8 μm
- Alignment Accuracy : down to 0.5 μm with TSA
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