Clean room Measurement instrument
AFM (Atomic Force Microscope)
| Model | NX10 |
|---|---|
| Manufacturer (Country) | Park systems (KOR) |
| Purchase Date | 2014-12-26 |
| Purpose of Use | Optical measurement of the interatomic forces on a sample surface using an ultrafine metal tip (cantilever); Sample surface scan by detecting the Van der Waals force acting between the cantilever tip and the atoms on the sample surface; Image generation using the position of the laser reflected from the cantilever tip. |
Product Description and Specifications▶ XY Scanner
Single module flexure XY-scanner with closed-loop control 50 µm × 50 µm (optional 10 µm × 10 µm or 100 µm × 100 µm) Resolution: 0.05 nm Position detector noise: < 0.25 nm (bandwidth: 1 kHz) Out-of-plane motion: < 2 nm (over 40 µm scan) ▶ Motorized Stage Sample size: up to 50 mm x 50 mm, up to 20 mm thickness Sample weight: up to 500 g XY stage travel: 20 mm x 20 mm Z travel: 25 mm Focus travel: 15 mm ▶ Z Scanner range Guided high-force flexure scanner Scan range: 15 µm (optional 30 µm) Resolution: 0.015 nm Position detector noise: 0.03 nm (bandwidth: 1 kHz) Resonant frequency: > 9 kHz (typically 10.5 kHz) ● Atomic-scale resolution depending on the diameter of the tip (nm) ● Contact mode: detecting interatomic repulsive forces ● Non-contact mode: detecting attractive forces between sample and tip (Van der Waals force) ● Tapping mode: gathering sample surface information through constant wide-amplitude oscillation and intermittent tip-sample contact ● Sample analysis without pretreatment (except for liquid samples) |
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