Clean room Lithography and milling machine
Focused Ion Beam(FIB)
| Model | Helios 5 UC |
|---|---|
| Manufacturer (Country) | Thermo Fisher Scientific |
| Purchase Date | 2023-12 |
| Purpose of Use | (Cross Section) Milling, TEM Prep. ect. |
Product Description and Specifications
(1) Electron Beam Resolution - 0.6nm at 30 kV- SE resolution - 0.7nm at 1 kV SE resolution (2) Accelerating voltage : 350 V to 30 kV (3) Magnification : 8x to 1,280Kx (4) High stability Schottky thermal field emitter and available unicolor optics. (5) Heated objective apertures to extend aperture lifetime - Ion beam resolution(FIB mode) (1) 2.5 nm at 30 kV - Field emission gun (1) Probe current: 0.8pA to 100nA - High Throughput ion column optics (1) High-current ion column with Ga liquid-metal ion source for use in high vacuum (2) Acceleration voltage: 0.5 to 30 kV (3) Probe current: 0.1 pA to 100 nA |
|
