INSTITUTE OF APPLIED PHYSICS

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spin coater

Model ACE200
Manufacturer (Country) DONG AH TRADE Corp.(Kor)
Purchase Date 2013-04-03
Purpose of Use Monitoring photo/E-beam lithography development and imaging

Product Description and Specifications

● Wafer size (max.): piece to 4" diameter, 6"
● Bowl size: 235 m/m Bowl
● Bowl material: SUS (option: P.P, Tefelon, etc)
● Special DC Motor: Up & Down free
● Step: 100 step
● Memory storage: 100 program
● Rotation Speed: 0 to 50-8,000 rpm
● Hold Time: 1-999sec
● Accuracy: ± 1 R.P.M
● acceleration, deceleration free: 3,000 R.P.M/sec
● Graphic Fuction: Real time for steps (graphical display of spin speed)
● Power Input: AC 220V, 50/60Hz
● Vacuum Input: -450~-650mmHg (6mm ID / 8mm OD)
● Display: LCD (Back Light)
● System Controller: MCU (Digital Microprocess)
● Dimension (W X D X H): 320 X 420 X 220 mm
● Free speed control: 0 or in the range of 50- 8,000 at the rate of 3,000 or 6,000/s
● Freely selectable of spin coater setting: 100 steps and 100 programmable modes and real-time graphical monitoring of the coating process at each step
● Spin controller program: simple, user-friendly operation
● Real-time RPM checking against the configured RPM
● Simple repair: simple architecture of spin motor + power supply + simple controller (board), which makes repair as simple as PC upgrade (2-3 days).
● Heavy-duty motor for spin coater lined to the monitoring program: high RPM; real-time graphical monitoring of spin operation; easy coating data output
● Position control function: optimized sample handling by facilitating the loading of sample (e.g., wafer and glass) at the desired position
● Stable coating process at low and high RPM (50-8,000 rpm )
초정밀 그래픽모드 스핀코터