INSTITUTE OF APPLIED PHYSICS

List

Material Analysis Laboratory 1. Device Fabrication

Ion Miller

Model KVET-IM2000L
Manufacturer (Country) 코리아바큠테크(주)
Purchase Date 2014-04-03
Purpose of Use Material Etching

Product Description and Specifications

  • Etching source : O2, Ar
  • Etching uniformity : < ±5%
  • Wafer size : 2.5“ 이내
  • Etching Speed : 0.75 ~ 10Å/sec@Ta (탄탈륨)
  • Loadlock chamber System
  • Ultimate Pressure : <2.3E-6Torr
Ion Miller