INSTITUTE OF APPLIED PHYSICS

List

Material Analysis Laboratory 1. Device Fabrication

Plasma Asher

Model AP-300 Plasma System
Manufacturer (Country) Nordson Coporation
Purchase Date 2014-05-28
Purpose of Use Material Etching

Product Description and Specifications

  • Plasma 본체 (Main body) 1set, Accessories 1set, Dry pump 1, RF generator
  • Equipment Size : 569W × 869D × 704H mm
  • Touch Screen & GUI
  • 13.56 MHz Generator
  • Ethcing source : O2, Ar
  • Mass Flow Controller : 4
Plasma Asher